Acquisition Of An Atomic Layer Deposit Equipment (Ald) Of Aluminum Oxide, Titanium Oxide And Hafnium Oxide

Name: Acquisition Of An Atomic Layer Deposit Equipment (Ald) Of Aluminum Oxide, Titanium Oxide And Hafnium Oxide
Start: 2025-06-03
End: 2025-06-16
Location: Rectorado de la Universitat Politecnica de Valencia

Rectorado de la Universitat Politecnica de Valencia Spain has Released a tender for Acquisition Of An Atomic Layer Deposit Equipment (Ald) Of Aluminum Oxide, Titanium Oxide And Hafnium Oxide in Technology Hardware and Equipment. The tender was released on Jun 02, 2025.

Country - Spain

Summary - Acquisition Of An Atomic Layer Deposit Equipment (Ald) Of Aluminum Oxide, Titanium Oxide And Hafnium Oxide

Deadline - Jun 16, 2025

GT reference number - 110184381

Product classification - Microelectronic machinery and apparatus

Organization Details:

Address - Spain

Contact details - 565656565

Tender notice no. - 76454545

GT Ref Id - 110184381

Document Type - Tender Notices

Notice Details and Documents:

Description - Description: The current ability to perform deposits of dielectric materials at the NTC Institute at micro/nanometric scale and wafer level is limited to chemical techniques in vapor phase (CVD). Improved steam deposit equipment with plasma is availa ble, which offers thin dielectric films. The ALD process consists of the growth of a thin film by consecutive atomic layers. The fact of having an ALD team that in addition to increasing the manufacturing capacity, will offer uniformity and compliance of the film on any scale and would have a clear impact on the quality of the research carried out as well as on the capabilities offered by the NTC Institute would be very high. ALD is the most adva

Gt Ref Id - 110184381

Deadline - Jun 16, 2025