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High-Vacuum Chamber For Thin-Film Synthesis

University of Helsinki Finland has Released a tender for High-Vacuum Chamber For Thin-Film Synthesis in laboratory equipment and services . The tender was released on Oct 23, 2025.

Country - Finland

Summary - High-Vacuum Chamber For Thin-Film Synthesis

Deadline - login to view

GT reference number - 120788653

Product classification - Microscopes

Organization Details:

  Address - Finland

  Contact details - 565656565

  Tender notice no. - 76454545

  GT Ref Id - 120788653

  Document Type - Tender Notices

Notice Details and Documents:

Description - Description: The procurement procedure was suspended due to a technical error. A new call for tenders has been published.---------------------------The Helsinki Accelerator Laboratory (HAL) at the Department of Physics of the University of Helsinki ( UH) is going to acquire a multi-source high vacuum (HV) chamber for thin-film deposition using magnetron sputtering. The magnetron sources will be capable of operating in direct-current magnetron sputtering (DCMS), radio-frequency magnetron sputtering (RFMS), and high-power impulse magnetron sputtering (HiPIMS) modes. Key feature of the deposition chamber will be the ability to accommodate and deposited homogeneously on substrates with diameter u

Gt Ref Id - 120788653

Deadline - Nov 30, -0001

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