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Country - Finland
Summary - High-Vacuum Chamber For Thin-Film Synthesis
Deadline - Nov 20, 2025
GT reference number - 120743881
Product classification - Laboratory, optical and precision equipments (excl. glasses)
Address - Finland
Contact details - 565656565
Tender notice no. - 76454545
GT Ref Id - 120743881
Document Type - Tender Notices
Description - Description: The Helsinki Accelerator Laboratory (HAL) at the Department of Physics of the University of Helsinki (UH) is going to acquire a multi-source high vacuum (HV) chamber for thin-film deposition using magnetron sputtering. The magnetron sour ces will be capable of operating in direct-current magnetron sputtering (DCMS), radio-frequency magnetron sputtering (RFMS), and high-power impulse magnetron sputtering (HiPIMS) modes. Key feature of the deposition chamber will be the ability to accommodate and deposited homogeneously on substrates with diameter up to 8 inches (203.2 mm). A quick access port for loading and unloading substrates with a diameter up to 8 inches (203.2 nm) to the dep
Gt Ref Id - 120743881
Deadline - Nov 20, 2025
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