Acquisition Of An Ion Implantation Equipment By Immersion In Plasma (Piii)

  Address - Spain

  Contact details - 565656565

  Tender notice no. - 76454545

  GT Ref Id - 114003042

  Document Type - Tender Notices

Description - Description: The PIII technique consists of the accurate implementation of doping ions (such as boron, phosphorus or arsenic) in semiconductor materials. The NTC works specifically on the manufacture of photonic devices and for the moment it does not have this technique or any similar to carry out “doping” of the components it manufactures. It would be a new technique allowing improvements in the quality and characteristics of the manufactured photonic components. The main element of a photonic component is the wave guide that is usually made on silicon (or silicon nitride) and this technique, implementing ions of different materials within these guides, would allow modifying the refract

Gt Ref Id - 114003042

Deadline - Aug 06, 2025